Materials Science In Semiconductor Processing

Journal Title：Materials Science In Semiconductor Processing

Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.

Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.

Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.

半导体加工中的材料科学为讨论用于（光）电子、传感器、检测器、生物技术和绿色能源的功能材料和设备的新型加工、应用和理论研究提供了一个独特的论坛。

每期都旨在简要介绍微电子、能量转换和存储、通信、生物技术、（光）催化、纳米和薄膜技术等不同领域的当前见解、新成就、突破和未来趋势、混合和复合材料、化学加工、气相沉积、器件制造和建模，这些是先进半导体加工和应用的支柱。

覆盖范围将包括：用于亚微米器件的高级光刻技术；蚀刻和相关主题；离子注入；损害演变和相关问题；等离子体和热化学气相沉积；快速热处理；先进的金属化和互连方案；薄介电层，氧化；溶胶-凝胶加工；化学浴和（电）化学沉积；化合物半导体加工；新型非氧化物材料及其应用； （宏观）分子和杂化材料；分子动力学、从头算方法、蒙特卡洛等；分立和集成电路的新材料和新工艺；磁性材料和自旋电子学；异质结构和量子器件；半导体的电学和光学特性工程；晶体生长机制；可靠性、缺陷密度、固有杂质和缺陷。

Materials Science In Semiconductor Processing创刊于1998年，由ELSEVIER SCI LTD出版商出版，收稿方向涵盖工程技术 - 材料科学：综合全领域，此刊是中等级别的SCI期刊，所以过审相对来讲不是特别难，但是该刊专业认可度不错，仍然是一本值得选择的SCI期刊 。平均审稿速度约1.7个月，影响因子指数3.085，该期刊近期没有被列入国际期刊预警名单，广大学者值得一试。